Flow controller Turbo™ 2950V

laboratoryhigh-precision

Designed specifically for leading edge microelectronic applications, the Turbo™ Liquid Flow Controllers 2950V pair with MSP's Turbo II™ Vaporizers to provide unmatched liquid source vapor delivery performance for semiconductor thin film deposition processes (including CVD, PECVD, ALD, and MOCVD). The Turbo™ Liquid Flow Controllers 2950V feature a custom-engineered high-precision, high-speed flow sensor and meticulously designed flow control electronics. These components deliver world-class performance essential for advanced semiconductor processing. - Precision Flow Control: The 2950 LFCs contain flow sensors and liquid control electronics to control the Piezo valve on MSP’s Turbo II™ Vaporizers. For vaporizers without an on-board liquid control Piezo valve, a 2950V series Turbo™ LFC can be used. - Applications: - Semiconductor thin film deposition processes - Chemical vapor deposition (CVD) - Plasma-enhanced chemical vapor deposition (PECVD) - Atomic layer deposition (ALD) - Metal-organic chemical vapour deposition (MOCVD) - Applications with requirements of frequent flow rate adjustments - Features and Benefits: - Precision flow control and adjustability - Exceptional accuracy and linearity - Ultra-fast response time - Superior repeatability - Wide flow range options - Technical Specifications / Features: - Custom-engineered high-precision, high-speed flow sensor - Meticulously designed flow control electronics - Designed for advanced semiconductor processing - Compatible with MSP Turbo II™ Vaporizers - Multiple model numbers for different flow ranges