Flow controller Turbo™ 2950

laboratoryhigh-precision

Built upon field proven technology, the MSP Turbo™ Liquid Flow Controllers 2950 were engineered to pair with MSP Turbo II™ Vaporizers to provide a reliable, high-performance liquid vapor delivery solution for semiconductor thin film deposition processes (including CVD, PECVD, ALD, and MOCVD). The Turbo™ Liquid Flow Controllers 2950 contain a custom engineered high-precision, high-speed flow sensor and meticulously designed flow control electronics to provide the world-class performance necessary for advanced semiconductor processing. - Precision Flow Control The 2950 LFCs integrate flow sensors and liquid control electronics to regulate the Piezo valve on MSP’s Turbo II™ Vaporizers. For vaporizers lacking an onboard Piezo valve, consider the 2950V series Turbo™ LFC for effective flow control. - Applications - Semiconductor thin film deposition processes - Chemical vapor deposition (CVD) - Plasma-enhanced chemical vapor deposition (PECVD) - Atomic layer deposition (ALD) - Metal-organic chemical vapour deposition (MOCVD) - Applications with consistent flow rate requirements - Features and Benefits - Fixed flow rate - Exceptional accuracy and linearity - Ultra-fast response time - Superior repeatability - Wide flow range options - Turbo™ LFC Models Available - Model Number: 2950-002, 2950-01, 2950-05, 2950-10, 2950-20, 2950-30 - TEOS Full Scale* (g/min): 0.2, 1, 5, 10, 20, 30 - TEMAZr Full Scale (g/min): n/a, 0.19, 0.95, 1.9, 3.8, 5.7 - H2O Full Scale (g/min): 0.14, 0.73, 3.6, 7.3, 14, 21 *Nominal max flow determined using TEOS as reference liquid at 23±2°C. Flow rate range is a function of specified liquid. - Brand: TSI (MSP Turbo™) - Model: 2950-01 (other models available: 2950-002, 2950-05, 2950-10, 2950-20, 2950-30) - Application: Semiconductor thin film deposition (CVD, PECVD, ALD, MOCVD) - Features: Fixed flow rate, high accuracy, fast response, repeatability, wide range