SEM microscope Sigma series
field emission scanningfor life sciences applicationsfor research

SEM microscope
SEM microscope
SEM microscope
SEM microscope
SEM microscope
SEM microscope
SEM microscope
SEM microscope
SEM microscope
SEM microscope
SEM microscope
SEM microscope
SEM microscope
SEM microscope
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Characteristics

Type
SEM, field emission scanning
Applications
for life sciences applications, for research, biological, inspection
Configuration
benchtop

Description

The ZEISS Sigma family combines field emission scanning electron microscope (FE-SEM) technology with an excellent user experience. Structure your imaging and analysis routines and increase productivity. Study new materials, particles for quality inspection or biological or geological specimens. Make no compromises in high resolution imaging – go to low voltages and benefit from enhanced resolution and contrast at 1 kV or below. Execute advanced analytical microscopy using best-in-class EDS geometry and get analytical data at twice the speed and with more precision.​ Sigma 360 is the core imaging facility’s choice — an intuitive FE-SEM for imaging and analytics. Sigma 560 uses best-in-class EDS geometry to deliver high throughput analytics and enable automated in situ experiments. The Core Facility’s Choice. Intuitive Acquisition. Be guided expertly from setup to AI-based results. Discover an intuitive imaging workflow. See the difference at 1 kV and below. Achieve enhanced resolution and optimized contrast. Perform VP imaging at the extremes to achieve excellent results on non-conductors. High Throughput Analytics. Automated in situ Experiments. Efficient analytics of real-world samples: SEM-based analyses with speed and versatility. Automate your in situ experiments: A fully integrated lab for unattended testing. Image challenging samples below 1 kV: Collect comprehensive sample information. Efficient Analytics of Real-world Samples Investigate with Versatility and Gain Speed in EDS Sigma 550's best-in-class EDS geometry increases your analytical productivity. The two 180° diametrically-opposed EDS ports guarantee throughput and shadow free mapping,

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