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... The paradigm change from batch production to continuous manufacture requires a new approach for the production processes used, as well as for the required automation technology. Comprehensive initiatives for quality ...
... Production systems for aseptic production of active ingredients (double-chamber systems) Custom system projects All systems and equipment fulfil ...
... The FlexAL atomic layer deposition (ALD) system offers a broad range of optimised high-quality plasma ALD and thermal ALD processes with maximum flexibility in precursors, processes gases, and hardware configuration within a single process ...
Oxford Instruments
... sample exchange Cold wall design with showerhead based uniform precursor delivery Optional liquid/solid source delivery system for growth of MoS2,MoSe2 and other TMDCs Excellent uniformity with flexible temperatures up to 1200°C Options ...
Oxford Instruments
... (PECVD) processes on large wafer batches and 300mm wafers, in a compact footprint, open-loading system. The large wafer platen allows for production scale batch processing and 300mm wafer handling. High ...
Oxford Instruments
... The PlasmaPro 100 PECVD system is specifically designed to produce high quality films with excellent uniformity and control of film properties such as refractive index, stress, electrical characteristics and wet chemical etch rate. Our ...
Oxford Instruments
... etching (RIE) processes on large wafer batches and 300mm wafers, in a compact footprint, open-loading system. The large wafer platen allows for production scale batch processing and 300mm wafer handling. High ...
Oxford Instruments
... diverse set of process requirements across the Micro Electromechanical Systems (MEMS), Advanced Packaging and Nanotechnology markets. Developed for research and volume production, the PlasmaPro 100 Estrelas offers the ...
Oxford Instruments
... The PlasmaPro 100 Cobra ICP RIE system utilises a high-density inductively coupled plasma to achieve fast etch rates. The process modules offer excellent uniformity, high-throughput, high-precision and low-damage processes for wafer sizes ...
Oxford Instruments
... devices. Specially designed for processes such as recess etching for GaN HEMT applications and nanoscale layer etching, the system's digital/cyclical etch process offers low damage, smooth surfaces. Digital/Cyclical etch process – ...
Oxford Instruments
... The PlasmaPro 80 ICP is a compact, small footprint system offering versatile ICP etch solutions with convenient open loading. It is easy to site and easy to use, with no compromise on process quality. The open load design allows fast ...
Oxford Instruments
... modules deliver isotropic and anisotropic dry etching for an extensive range of processes. It is suitable for research and production customers, providing a controlled environment that improves process repeatability with load-lock and ...
Oxford Instruments
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