The high throughput milling system optimizes the ion source electrodes and enables higher accelerating voltages, thus improving the ion-beam current density.
Our newly developed ion source achieves a high milling rate of cross-section of 1.2 mm/h or more (2.4 times than the previous milling rate.)
The right SEM image shows an Sn-Bi alloy with a melting point of 150°C.
A low melting-point metal can be melted due to the processing heat; therefore, cooling of the metal is required before milling. High throughput milling is applied to the heat-sensitive specimen while the specimen is kept cooled *3.
Then, a cross-section specimen with a reduced heat damage is obtained in a short time.
The new high throughput milling system has enabled the irradiation of an ion beam onto a larger area of the specimen.
Planar surface milling is effective to remove scratches generated on the specimen surface or crystalline strains, which are caused by mechanical polishing.
Planar surface milling of a concrete
Accelerating voltage: 10 kV
Milling time: 20 min
Large-area planar surface milling was applied to a concrete with a width of 20mm.
After milling, polish scratches and contamination were removed, allowing for clear observation of particles of stone and cement contained in a concrete.