Production system PlasmaPro 80 RIE

The PlasmaPro 80 reactive ion etch (RIE) is a compact, small footprint system offering versatile etch and deposition solutions with convenient open loading. It is easy to site and easy to use, with no compromise on process quality. The open load design allows fast wafer loading and unloading, ideal for research, prototyping and low-volume production. It enables high performance processes using optimised electrode cooling and excellent substrate temperature control. Open load design allows fast wafer loading and unloading Excellent etch control and rate determination Excellent wafer temperature uniformity Up to 200mm wafers Low cost of ownership Built to Semi S2/S8 standards System features Small footprint - Easy to site Optimised electrode cooling - Substrate temperature control High-conductance radial (axially symmetric) pumping configuration - Guaranteed enhanced process uniformity and rates are Addition of < 500ms data logging - Traceability and history of chamber and process conditions Close-coupled turbo pump - High pumping speed and excellent base pressure Clear ease of access to key components - Improved serviceability and maintenance X20 control system - Greatly increases data retrieval and delivers faster, more repeatable matching Fault and tool diagnostics via front end software - Rapid fault diagnosis Laser end-point detection using interferometry - Measure etch depth in transparent materials on reflective surfaces (for example, oxides on Si), or reflectometry for non-transparent materials (such as metals) to determine layer boundaries