Infrared spectrometer IconIR300™

AFMinspectionfor nanotechnology

Adds 300 mm of sample access for semiconductor R&D, failure analysis, and nanocontaminant identification The Dimension IconIR300™ large-sample nanoIR system delivers rapid, high-accuracy nanoscale characterization for semiconductor applications, supporting a broad spectrum of material types and sample sizes up to 300 mm wafers. By combining proprietary photothermal IR spectroscopy with advanced AFM property mapping, IconIR300 enables automated wafer inspection and defect identification on samples that challenge conventional techniques. The system’s architecture supports rapid chemical imaging and quantitative analysis, extending AFM-IR capabilities to new semiconductor segments and materials. Integrated recipe-based measurement automation and robust data analysis software streamline workflows, ensuring reproducible, high-throughput measurements for process development, quality control, and production environments. Whole-Wafer nanoscale chemical and material property characterization Combines IR spectroscopy and AFM property mapping for highly accurate, non-destructive measurements of 200 mm and 300 mm wafers. Unambiguous identification of organic/inorganic nano-contaminants Improves semiconductor wafer and photomask quality with photothermal AFM-IR data that directly correlates to FTIR libraries. Automated recipe-based measurements Deliver user-friendly access to comprehensive data and KLARF file support. ly the Dimension IconIR300 system provides: Whole-wafer, non-destructive measurement of 200 mm and 300 mm wafers; Unambiguous identification of organic and inorganic nano-contaminants on semiconductor wafers