Optical microscope DM12000 M
laboratoryinspectionupright

Optical microscope - DM12000 M - Leica Microsystems - laboratory / inspection / upright
Optical microscope - DM12000 M - Leica Microsystems - laboratory / inspection / upright
Optical microscope - DM12000 M - Leica Microsystems - laboratory / inspection / upright - image - 2
Optical microscope - DM12000 M - Leica Microsystems - laboratory / inspection / upright - image - 3
Optical microscope - DM12000 M - Leica Microsystems - laboratory / inspection / upright - image - 4
Optical microscope - DM12000 M - Leica Microsystems - laboratory / inspection / upright - image - 5
Optical microscope - DM12000 M - Leica Microsystems - laboratory / inspection / upright - image - 6
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Characteristics

Type
optical
Applications
laboratory, inspection
Ergonomics
upright
Configuration
benchtop
Light source
LED, UV

Description

Improve your decision-making for product quality and save time by gaining deeper insights into samples with the DM8000 M and DM12000 M optical inspection systems. These inspection microscopes offer fast and reliable inspection and analysis of materials like semiconductors and wafers, enabling you to perform quality control and detect defects fast. Reveal hidden details Detect defects and conduct sample overviews quickly for improved analysis and decision-making. Optimize your way of working Automation and user-friendly operation minimize the need for adjustments, saving valuable time during the inspection process. Maintain user comfort in a safe and controlled environment Work in a relaxed working position, ensuring optimal comfort throughout the inspection process, to help increase productivity. Visualize structures and defects quickly Detect and analyze various structures and defects, such as scratches and contamination, on your samples. Choose from an array of illumination and contrast methods, such as brightfield, darkfield, polarization, differential interference contrast (DIC), fluorescence (Fluo), and infrared (IR), to help you perform inspection quickly and reliably. Improve resolution with ultraviolet (UV) light. Gain additional surface information with oblique illumination. Combine it with UV to further enhance the contrast. Find defects faster during fracture analysis with higher contrast supported by the advanced darkfield technique with Plan Fluotar objectives (20x, 50x, and 100x). Save time with a fast sample overview Reveal macro defects and structures in material samples quickly using the optional 0.7x Macro objective.

Catalogs

DM12000 M
DM12000 M
8 Pages
DM8000 M
DM8000 M
8 Pages
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.