Focused ion beam microscope NX5000
opticalcompoundTEM

focused ion beam microscope
focused ion beam microscope
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Characteristics

Type
optical, compound, TEM, SEM, FIB-SEM, focused ion beam
Applications
laboratory
Configuration
tabletop
Other characteristics
high-resolution
Resolution

0.7 nm, 1.5 nm, 4 nm, 50 nm, 60 nm

Description

The Hitachi Ethos FIB-SEM incorporates the latest-generation FE-SEM with superb beam brightness and stability. Ethos delivers high-resolution imaging at low voltages combined with ion optics for nanoscale precision processing. Key Features 1. High-Performance FE-SEM Column with Dual Lens Mode Ultra-high-resolution observation (HR mode: semi-in-lens) High-accuracy end-point detection in real time (FF mode: Field Free (time sharing mode)) 2. High-Throughput Material Processing Ultra-fast processing with high ion-current density (Max. beam current: 100 nA) User programmable script for auto processing and observation 3. Microsampling System Fully integrated sample-orientation control for Anti-Curtaining Effect (ACE technology) TEM sample preparation for uniform lamellas at any orientation 4. Triple-Beam Capable, Delivering Advanced Quality Results Low-acceleration noble-gas ion-beam material processing Innovative functions reduce Ga ion related and other milling artifacts 5. Large Multi-Port Chamber and Stage for Various Applications Large sample size capable system with exceptional stage stability Full range enhanced long-distance tracking (155 x 155mm) Refined Electron Optics and Multi-Signal Detection The Ethos SEM column is composed of a magnetic- and electrostatic-field compound objective lens system configured as two lens modes.

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