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Back-scattered electron microscopes
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Magnification: 20 unit - 2,000,000 unit
Resolution: 0.9, 0.6 nm
Equipped with a 150mm sample airlock as standard, the SU8700 offers high sample throughput even for larger samples and a constantly clean sample chamber environment for low-contamination, high-resolution imaging. In addition, the sample chamber can be ...
Hitachi High-Tech Europe GmbH
Magnification: 20 unit - 2,000,000 unit
Resolution: 0.7, 0.6 nm
... The SU8600 is the successor to the proven Regulus field emission SEM family and fulfills the highest requirements for imaging-oriented applications. The cold field emitter with its near monochromatic emission, combined with a magnetic ...
Hitachi High-Tech Europe GmbH
Magnification: 20 unit - 2,000,000 unit
Resolution: 0.8, 0.9 nm
... probing, microtome serial sections, etc.). Equipped like the SU8700 with Hitachi’s universal high-resolution, field-free electron optics (consisting of Schottky emitter and beam booster), the SU7000 also has a large analytical sample ...
Hitachi High-Tech Europe GmbH
Magnification: 5 unit - 800,000 unit
Resolution: 15, 4, 3 nm
... platform. Product features: - Highly efficient Hitachi detectors: -- Secondary electron detector for high vacuum -- 5-segment semiconductor backscattered electron detector for high and low vacuum, selection ...
Hitachi High-Tech Europe GmbH
Magnification: 6, 8,000,000 unit
Resolution: 15, 4 nm
... High-resolution electron optics with beam energies between 300eV and 20keV - High and adjustable low vacuum up to 100Pa - SE and 4+1 segment backscatter detector standard, low vacuum SE optional (UVD); can also be used for cathodoluminescence ...
Hitachi High-Tech Europe GmbH
Magnification: 10 unit - 250,000 unit
Length: 617 mm
... Designed as a logical extension of optical stereo microscopy, the TM4000 III is an entry-level device for scanning electron microscopy. It allows you to image samples in the shortest possible time with good resolution, depth of field, ...
Hitachi High-Tech Europe GmbH
Resolution: 2.8, 60, 4, 3.5 nm
... NX2000 is a FIB-SEM optimised for semiconductor applications (defect analysis with KLARF coordinate import, TEM lamella extraction, device development). With 205 x 205 mm X,Y travel, the sample stage even allows full-surface processing ...
Hitachi High-Tech Europe GmbH
Magnification: 20 unit - 2,000,000 unit
Resolution: 0.8, 0.9 nm
... efficient simultaneous acquisition of multiple secondary electron and back- scattered electron signals. Multi-Channel Imaging The number of the detectors mounted on the SEM ...
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