Automatic surface coating system EM ACE600

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Overview
Prepare fine-grained thin films for electron microscopy with the EM ACE600 sputter coater. Precise, automated carbon and metal coating processes provide reproducible results and enable higher sample throughput. For research use only.

Key capabilities

• High‑vacuum coater configurable for multiple sources: sputter, carbon thread, carbon rod and e‑beam.
• Dual‑source metal process chamber enabling up to two different sources in one run without breaking vacuum.
• Automated, recipe‑based coating processes and front‑door loading for safe, convenient handling.
• Cryo workflow support: cryo transfer interface, cryo stage and basic fracture device for coating under cryogenic conditions and cryo transfer to SEM.
• Rotary shadowing (LARS) option with e‑beam source and motorized LARS stage for low‑angle shadow coating of nanoscale structures.
• Workflow‑based touchscreen interface for simple, single‑button execution of routine processes.

Sputter coating
Produce reproducible, fine‑grained sputter coatings. The system attains an excellent base vacuum (< 2 x 10-6 mbar standard) with an optional Meissner trap to reach the 10-7 mbar regime. Adjustable sample distance and coating angle plus a rotating stage allow uniform coatings and process optimization for different morphologies and targets. Designed for high‑magnification SEM analysis (up to ~200kX and beyond).

Carbon coating
Deposit ultra‑thin, homogeneous carbon films via carbon thread evaporation, carbon rod evaporation or e‑beam evaporation. Leica adaptive pulsing for carbon thread provides precise amorphous films with sub‑nanometer control while minimizing heat impact. Suitable for TEM support layers, diffuse protection coatings and large homogeneous carbon layers. E‑beam evaporation is available for applications requiring low beam divergence such as rotary shadowing.

Adaptability & configuration

• Optimized two‑source concept with angled ports and rotating stage for even thin‑film distribution across a full 100 mm stage.
• Choice of carbon thread, carbon rod, e‑beam and sputter heads; optional glow discharge capability.
• On‑site upgradable with a broad selection of sample holders and stages (motorized 3‑axis, rotary/manual stages, dedicated cooling stage).
• Quick‑exchange stage dishes for multi‑purpose laboratory workflows.

Operational benefits

• Front‑door loading for safe handling of sensitive samples.
• Lightweight, easy‑to‑handle sources for daily operation.
• Automated recipes and recipe‑based processing for reproducibility and improved throughput.

Applications

• High‑resolution SEM imaging of flat or structured non‑conductive specimens.
• Contrast enhancement of nanometer‑scale structures (proteins, DNA) via rotary shadowing and metal deposition.
• TEM support film production (ultra‑thin carbon support layers 1–5 nm, baked to reduce contamination).
• Cryo‑SEM sample preparation and transfer workflows.

Technical specifications

• Model: EM ACE600
• Type: High‑vacuum carbon, e‑beam and sputter coater
• Base vacuum: < 2 x 10-6 mbar (standard)
• Optional vacuum enhancement: Meissner trap to 10-7 mbar regime
• Sources supported: sputter, carbon thread evaporation, carbon rod evaporation, e‑beam evaporation
• Dual‑source configurable metal process chamber (up to two different sources in one process)
• Stage diameter/coverage: optimized for full 100 mm stage uniformity
• Adjustable sample distance and coating angle; rotating stage for homogeneous deposition
• Carbon film thickness control: precise deposition (typical ultra‑thin films 1–5 nm)
• Rotary shadowing (LARS) capability for low‑angle metal deposition
• Cryo compatibility: cryo transfer interface, cryo stage, basic fracture device
• Loading: front‑door loading for safe sample handling
• User interface: workflow‑based touchscreen, automated recipe processing
• Upgradability: on‑site upgrade options (sources, stages, glow discharge)
• Intended use: For research use only