Laboratory thermostat Semistat

processfloor-standinganalog

Thermoelectric process thermostats from –20 to 90 °C for the semiconductor industry Fast and precise temperature control for complex processes. Based on the tried-and-tested principles of heat transfer used for Peltier elements, the LAUDA Semistat thermoelectric systems for temperature control offer reproducible temperature control for plasma etching applications. The dynamic temperature control of the electrostatic wafer chuck (ESC) makes it possible to use devices with all types of etching processes. Energy-efficient and space-saving, with stable temperature control, these clever systems are perfect for manufacturing ever-smaller components. Overview Benefits and added value Compressor and refrigerant-free system with low energy consumption Smallest footprint in the industry, ideally suited for underfloor installation Extremely low volume of heat transfer fluid Working range Point of use (POU) temperature control systems can reduce energy consumption by up to 90 % compared to compressor-based systems. Minimal space requirements with the option of underfloor installation at the point of use minimizes cleanroom use. Quick and precise temperature control of the process temperature profiles to ±0.1 °C improves wafer-to-wafer homogeneity.